Silicon Tetrachloride Conduct Electricity-manufacture,factory,supplier from China

In silicon tetrachloride purification, boron is the most difficult impurity to remove. Researchers have proposed compound method to remove boron from silicon tetrachloride, which has achieved satisfactory results and has been widely used in industrial production.

In recent years, China's polysilicon production has shown geometric development, but the disposal of polysilicon by-product silicon tetrachloride has become a difficult to step over the development of polysilicon industry "sill", let the silicon industry wear the hat of high pollution.

The basic principle of solid adsorption is adsorption separation based on the different polarity of chemical bonds of each component in a compound. Silicon tetrachloride is a symmetric molecule with no dipole moment. In contrast, the contained impurities such as BCl3, AlCl3, FeCl3, PCl3, etc. are asymmetric molecules with considerable dipole moments, which strongly tend to form additive chemical bonds and are easily adsorbed by the adsorbent.

Silicon tetrachloride is an important chemical raw material, it is widely used to produce high-purity silicon, silane, silicone ester, silicone oil, silica gel and other products, widely used in ink, paint, resin, rubber, medicine, grease and other fields; Silicon tetrachloride can also be used to manufacture optical fiber, polysilicon, silicon dioxide, etc., in communications, photovoltaic power generation, optical instruments and other fields of application; In addition, silicon tetrachloride can also be used in the military field, metallurgy, casting and other fields.

Distillation is the use of SiCl4, and the difference between the relative volatility of impurities components, through several partial gasification and partial condensation process, to achieve the separation of mixed liquid, so as to obtain high purity silicon tetrachloride products.

Silicon tetrachloride which chemical formula is SiCl4 is an inorganic compound, because silicon chloride only exists in the form of SiCl4, silicon tetrachloride is also directly called silicon chloride. The appearance of this product is light yellow liquid, and the appearance of high-purity silicon tetrachloride is colorless and transparent liquid, volatile, with special odor, toxicity and corrosion. Silicon tetrachloride can be miscible with benzene, chloroform, ether, carbon tetrachloride and other organic solvents. It can be hydrolyzed in humid air and react violently with water.

The main by-product of trichlorosilane, silicon tetrachloride, is also the main raw material for the manufacture of silicone, its finished products are silicone ester, silicone oil, high temperature insulating paint, silicone resin, silicone rubber and heat resistant cushion lining materials. High purity silicon tetrachloride is also an important raw material for manufacturing high purity silicon dioxide, inorganic silicon compounds, quartz fibers and optical fibers.

Silicon tetrachloride is mainly used in the manufacture of silicone esters, gaseous silica, silicone monomer, silicone oil, high temperature insulating paint, silicone resin, silicone rubber and so on. High-purity silicon tetrachloride is the main raw material for manufacturing fiber prefabricated rod, and the quality of fiber prefabricated rod directly determines the fiber performance. Therefore, high-purity silicon tetrachloride is the core raw material of fiber industry.

SiCl4 is one of the most important inorganic silicon compounds, is a colorless, transparent, flowing smoke liquid, with suffocating odor, soluble in benzene, ether, chloroform and other most organic solvents. Silicon tetrachloride is a volatile liquid with strong asphyxiating odor. It can be used as raw materials for the production of gaseous silica, high purity silicon and organosilicide. The upstream of the silicon tetrachloride industry chain is the raw material market, mainly silicon powder, ferrosilicon, hydrogen chloride, etc.

Chlorine hydrogenation technology is to add HCl on the basis of low temperature hydrogenation technology to further reduce the reaction temperature and increase the yield of trichlorosilane. Chlorine hydrogenation reaction principle is as follows: 2SiCl4(g)+H2(g)+HCl(g)+Si(s)=3SiHCl3(g). Hydrogen plasma is generated by hydrogen discharge, which is passed into the reactor to react with silicon tetrachloride gas. Since hydrogen is dissociated into hydrogen atoms, the reactivity is greatly increased and it can easily react with silicon tetrachloride to form trichlorosilane.

High temperature hydrogenation of silicon tetrachloride is an important method to treat silicon tetrachloride as a by-product of polysilicon. High temperature hydrogenation is silicon tetrachloride and hydrogen as raw materials, heated by 1200 ~ 1250℃ graphite heater, thermal reduction reaction to produce  trichlorosilane. The advantages of the process are that the whole system is closed circulation, suitable for continuous and stable operation; Trichlorosilane products of high purity, need to distillation links less.

Silicon tetrachloride is an important raw material and intermediate product in the process of organic silicon synthesis and polysilicon production. Under different environmental conditions, silicon tetrachloride can react with a variety of substances to produce new substances.

At present, there are two main synthesis methods of trichlorosilane: one is the traditional synthesis method, that is the silicon chloride method. The other is hydrolyzation of tetrachloride. At present, the mainstream method of polysilicon production is the modified Siemens method, using trichlorosilane reduction method. In recent years, with the continuous decline of polysilicon price, polysilicon production enterprises pay more and more attention to the control of production cost.

Since May 2022, trichlorosilane has been sustained upward by the downward trend in silicon metal prices.

The principle is to reduce high purity trichlorosilane with high purity hydrogen on the high purity silicon core at about 1100℃ to generate polycrystalline silicon deposited on the silicon core. On the basis of the traditional Siemens process, the improved Siemens process is equipped with a supporting process of energy saving, consumption reduction, recycling and utilization of a large amount of H2, HCI, SiCI4 and other by-products and a large amount of by-production heat energy.

Colorless liquid with smelly odor. it'll decompose with water and dissolve in carbon disulfide, carbon tetrachloride, chloroform, benzene, and plenty of others. flammable, can spontaneously ignite within the air. toxic!It could go through an addition response with olefins.The hydrosilylation response of ethylene is as follows: cl3si-h + h2c=ch2 → cl3si-ch2-ch3 .

Colorless liquid with pungent odor. It will decompose with water and dissolve in carbon disulfide, carbon tetrachloride, chloroform, benzene, etc. Flammable, can spontaneously ignite in the air. Poisonous! SpecificationInChIKeyZDHXKXAHOVTTAH-UHFFFAOYAHUN number1295RTECSVV5950000Chemical FormulaSiHCl3Mole Mass135.4524 g·mol⁻¹Exteriorcolourless liquidDensity1.342 g/cm3Melting Point-126.6 °CBoiling Point31.8 °CSolubility (water)Decomposition by waterVapour Pressure0.660 bar (20 °C)

Colorless liquid with stinky smell. it will decompose with water and dissolve in carbon disulfide, carbon tetrachloride, chloroform, benzene, and many others. flammable, can spontaneously ignite inside the air. poisonous!SpecificationInChIKeyZDHXKXAHOVTTAH-UHFFFAOYAHUN number1295RTECSVV5950000Chemical FormulaSiHCl3Mole Mass135.4524 g·mol⁻¹Exteriorcolourless liquidDensity1.342 g/cm3Melting Point-126.6 °CBoiling Point31.8 °CSolubility (water)Decomposition by waterVapour Pressure0.660 bar (20 °C)It can undergo an addition reaction with olefins.

The production process of trichlorosilane is mostly prepared by reaction of gold-grade silicon metal powder and hydrogen chloride gas in a fluidized bed reactor. Generally using gold grade metal silicon powder, hydrogen chloride gas by the combustion reaction of chlorine and hydrogen gas. Reaction temperature is 300-400 degrees, most of the pressure using micro positive pressure operation.

Colorless liquid with stinky scent. it's going to decompose with water and dissolve in carbon disulfide, carbon tetrachloride, chloroform, benzene, and lots of others. flammable, can spontaneously ignite in the air. poisonous!It may undergo an addition reaction with olefins.The hydrosilylation reaction of ethylene is as follows: cl3si-h + h2c=ch2 → cl3si-ch2-ch3 .

Trichlorosilane (TCS or SiHCl3) is generated as follows within a high temperature, pressurized reactor: Si + 3 HCl ➡ SiHCl3 + H2 ，Si + 3 SiCl4 +2 H2 ➡ 4 SiHCl3 .The TCS is then sent to the CVD (Chemical Vapor Desposition) reactor. In the Siemens process, high-purity silicon "starter" rods or hairpins are exposed to trichlorosilane at 1150 °C in the CVD reactor.

Cyclohexylamine, an organic compound with the chemical components of c6h13n, is a drab to yellow liquid, soluble in water and miscible in most organic solvents. It is mainly used as a solvent, and can also be used to prepare desulfurizer, rubber antioxidant, vulcanization accelerator (CZ), cyclamate, medical raw materials, chemical additives for plastics and textiles, boiler feed water treatment agent, metal corrosion inhibitor, emulsifier, preservative, antistatic agent and latex coagulant. 

A sulfonate of cyclohexylamine; used as an artificial flavoring in food, beverages, and medicine. Also used as an acid gas absorber. Used as a pH regulator for boiler feed water. Cyclohexylamine is a volatile substance that can easily reach the whole system after dosing.If pH is lower than 8.5, the treatment effect of cyclohexylamine is not good. Synthetic desulfurizer, rubber promoter, dye, antistatic agent, corrosion inhibitor, pesticide fungicide, insecticide and other intermediates. Used as boiler water treatment agent, corrosion inhibitor, rubber promoter, etc.

Devices that use tail gas to recover cyclohexylamine are characterized in that they include: spray tower, circulating pump, condenser, defogger, photooxygen catalytic oxidizer, ozone treatment device, blower, chimney. Described in the circulating pump and spray the bottom connection, as described in the other side of the circulating pump are connected to the condenser, the condenser and the upper spray tower connection, described in the spray tower are connected to the top of demister, described in the mist bottom and photocatalytic oxidation, photocatalytic oxidation is described, ozone